2023年9月6日 ~ 9月8日

蔡司顯微鏡

@ SEMICON 國際半導體展

蔡司顯微鏡參與 SEMICON Taiwan 國際半導體展,與您一同探究市場趨勢,分享最新影像技術發展。

蔡司顯微鏡是您半導體與電子材料研究領域中,失效分析的最佳夥伴。

期待您的蒞臨參觀!

  

  • 體驗虛擬實境 VR 操作 3D X-ray 以及電子顯微鏡
  • Tech Talks 技術演講
  • 體驗光學顯微鏡的實機Demo
  • 與專家對談,了解最新的影像技術分析在半導體的運用

蔡司顯微鏡 - 展場活動

南港展覽館一館一樓 - I 2216

VR Demo 虛擬實境體驗

運用虛擬實境VR Demo,了解最新的非破壞性 3D X-ray 顯微鏡,以及 Crossbeam Laser 顯微鏡。

錫球陣列封裝及覆晶片封裝中,錫球的完整性檢驗、印刷電路板及載板製程中可能產生的缺陷,以及各種材料結構檢驗分析及尺寸量測,皆可運用此非破壞性的高解析3D X-ray影像技術分析。

ZEISS Crossbeam Laser 成功將飛秒雷射、鎵離子FIB與場發射電子顯微鏡整合成單一工具,提供最快速的指定區域橫切面工作流程。為封裝工程師與失效分析師提供最高影像效能及最快速的橫切面解決方案,同時將樣品損壞降至最低。

  

體驗光學顯微鏡 Demo

現場將展示 ZEISS Axio Imager Vario,非常適合材料檢查和分析物體,具有較大的樣品空間,包括太陽能電池、晶圓、平板顯示器,具有蔡司一貫的高光學性能、多擴充性和穩定性,具有可靠的聚焦和精密度。

可以放6吋、8吋、12吋的wafer,XYZ全電動控制、自動追焦。可以拍攝大範圍面積,同時最高解析度可以達到200nm。也可以升級成共軛焦顯微鏡,解析度可以進一步提升到90nm。

與蔡司專家的 Coffee Chat

帶著您的好奇心,來與蔡司專家面對面的討論,我們將為您介紹蔡司獨有的工作流程以及各式的顯微鏡關聯運用,在材料對比度以及掃描的範圍上的優異表現。

了解蔡司顯微鏡如何提供大視野以及無扭曲的清晰低電壓影像,以及如何有效率且精確的定位缺陷位址。

誠摯歡迎您來展場I2216參觀。

Tech Talks 技術演講

展覽期間,每日的中午12點與下午3點,蔡司準備了豐富的技術分享以及輕食小點心,邀請您來歇歇腳,聆聽最新的影像技術在半導體研發的運用。

How AI helps our daily microscopy routine?

High throughput sample preparation and analysis

The future of Nano Probing

Non destructive defect localization and process characterization

2D / 3D FIB-SEM Analysis in Logic and Memory Devices

蔡司顯微鏡 - 應用領域

ZEISS provides the most comprehensive microscopy portfolio in the electronics and semiconductor industries, with superior imaging and optimized workflows to meet productivity needs for R&D, production, and failure analysis

先進封裝

3D Heterogeneous Integration

Innovations in semiconductor packaging, such as new 2.5D/3D designs using through-silicon vias (TSVs) and chiplets using hybrid bonding, enable system-in-package (SIP) and heterogeneous integration. Characterization and failure analysis of these advanced technologies are critical for overall development and delivery of high-yielding, reliable products.

New package architectures introduce new types of defects buried deep below many layers, challenging the entire failure analysis workflow – from electrical characterization to physical analysis and root cause determination. Traditional workflows for high-resolution package analysis of buried features lack the required combination of speed, resolution, and 3D information to understand the problems.

  

失效分析

Structural and Electrical Characterization

Semiconductor products serve the needs of transportation, work, social communication, and industrial infrastructure. There is constant demand for higher computing performance in ever smaller form factors. Logic and memory semiconductor structure analysis is challenged by novel materials and increasingly complex geometries. Shrinking transistor sizes at the newest technology nodes demand the highest performance for electron microscopy and nanoprobing applications.

  

材料分析

Faster Time to Market

The mobile communication, Internet of Things (IoT), cloud computing, and the electrification of automotive industries are driving huge demand for high-performing “More than Moore” semiconductor devices, which require the integration of new materials and processes, or novel silicon architectures and packaging technologies such as micro-electromechanical systems (MEMS). Direct band gap and wide band gap materials such as gallium arsenide (GaAs), silicon carbide (SiC), and gallium nitride (GaN) present new challenges to equipment manufacturers and device fabricators alike. Many of these devices also integrate traditional ICs, which creates fabrication and packaging challenges.

To shorten the development cycle and speed time to market on these sophisticated devices, manufacturers need advanced analysis tools that can support complex new materials integration and root-cause analysis of failures.

良率檢測

Improve Production Yields

Consumer demand for brighter and more interactive display panels in electronic products is driving innovation in the highly competitive display industry. Display technology is evolving, with LCD and rigid organic light-emitting-diode (OLED) technology now produced in large volumes at low cost, and premium consumer products offering flexible OLED and microLED displays.

OLED, microLED and photonics applications are complex systems utilizing sensitive and difficult-to-analyze materials that demand advanced microscopy technologies in their development and manufacture.

SEMICON TAIWAN 2023

台北南港展覽館

  • 展覽日期與時間:

9 月 6 日 星期三 10:00 - 17:00

9 月 7 日 星期四 10:00 - 17:00

9 月 8 日 星期四 10:00 - 16:00

  • 地點:

  台北南港展覽館 1 館 1 樓

  • 蔡司攤位號碼:              I 2216

  

Tech Talks 技術演講

蔡司專家與您分享

9 月 6 日 星期三
9 月 7 日 星期四
9 月 8 日 星期五

中午演講

12:00 pm

How does AI help in the Semicon FA Lab?

人工智能的快速進步改變了許多行業,演講探討了 AI 在半導體領域顯微例程中的融合,關注電子顯微鏡和 X-ray 顯微鏡,概述了 AI 在顯微技術中的影響和案例研究,探討了融合挑戰,基於 AI 的圖像分析如何助力於半導體研究,例如預測材料特性增強決策,重塑效率與創新,提升競爭優勢。

 

YanJing Yang

The future of Nano Probing

奈米電性量測與Nano e-Analysis System技術分享

  • Low e-beam damage for future nano probing
  • Excellent Stability & Reliability for future nano probing
  • Pico-ampere leakage defect localization for future nano probing
Mesoscope Ryan Dai

2D / 3D FIB-SEM Analysis in Logic and Memory Devices

This talk provides details on sample preparation techniques for advanced semiconductor devices for 2D and 3D analysis.   3D FIB Tomography with precise slice thickness control and reconstruction delves into the intricate three-dimensional architecture, providing deeper insights and revealing complex defects . The talk underscores the importance of overcoming these sample preparation and characterization challenges for advanced logic and memory devices.

Arun Prabha

下午演講

15 pm

High throughput sample preparation and analysis

半導體先進封裝的尺寸越來越大,樣品的厚度也越來越厚,而現有的分析設備已不足以滿足這樣的改變,蔡司顯微鏡為了協助客戶面對這樣的挑戰,推出了搭載飛秒雷射的 crossbeam,讓客戶以最快的時間就能將深埋在樣品內部的 ROI 暴露出來後再做更進一步的分析。

  

Bessy Chiu

Non destructive defect localization and process characterization

今年全新發表的非破壞性 3D X-ray顯微鏡 Xradia 630 Versa 以及帶有深度學習模塊的 Deep Recon Pro 以及 DeepScout,達到解析度的提升外,還打破了原本高解析度掃描視野小、時間長的困境, 給您最好的工作效率與最佳對比度的分析影像。

  

Nicky Liu